Electrical Activation, Deactivation, and Reactivation Mechanism Study of Plasma Doping Processes PROJECT TITLE :Electrical Activation, Deactivation, and Reactivation Mechanism Study of Plasma Doping ProcessesABSTRACT:Advanced doping techniques in low-energy high-dose regimes as well as n-type PH3 and AsH3 plasma doping (PLAD) and p-sort B2H6 and BF3 PLAD are studied and characterized on the electrical activation, deactivation, and reactivation mechanisms. As a result of deactivation and reactivation characteristics are independent of ion species and dependent solely on the carrier, electrical-assisted diffusion of carriers (trap in native oxide) is confirmed as a hypothesis of a major dopant deactivation kinetics. Secondary ion mass spectrometry/ angle-resolved X-ray photoelectron spectroscopy and Hall ways are employed in this paper to supply more supporting evidence and knowledge. With characteristics just like those of beam-line (BL)-based implants, n-type PLAD shows a lot of serious deactivation than p-kind PLAD. n-type PLAD shows a a lot of significant reactivation impact than their BL implant counterparts. In keeping with the deactivation mechanism study, a answer was proposed and used to reduce the deactivation issue for nMOS devices. Did you like this research project? To get this research project Guidelines, Training and Code... Click Here facebook twitter google+ linkedin stumble pinterest Big Data and IT-Enabled Services: Ecosystem and Coevolution Medium access control design for full duplex wireless systems: challenges and approaches