PROJECT TITLE :

Resistive Open Faults Detectability Analysis and Implications for Testing Low Power Nanometric ICs

ABSTRACT:

Resistive open faults (ROFs) represent common manufacturing defects in IC interconnects and lead to delay faults that cause timing failures and reliability risks. The nonmonotonic dependence of ROF-induced delay faults on the availability voltage $(V_rm DD)$ poses a priority as to whether single- $V_rm DD$ testing will suffice for low power nanometric styles. Our analysis shows multi- $V_rm DD$ tests might be needed, relying on the test speed. This data will be exploited in tiny delay fault testing to scale back the chances of take a look at escapes whereas minimizing cost.