Global and Local Virtual Metrology Models for a Plasma Etch Process PROJECT TITLE :Global and Local Virtual Metrology Models for a Plasma Etch ProcessABSTRACT:Virtual metrology (VM) is the estimation of metrology variables that may be expensive or difficult to measure using readily available process information. This paper investigates the application of global and local VM schemes to a data set recorded from an industrial plasma etch chamber. Windowed VM models are shown to be the most accurate local VM scheme, capable of producing useful estimates of plasma etch rates over multiple chamber maintenance events and many thousands of wafers. Partial least-squares regression, artificial neural networks, and Gaussian process regression are investigated as candidate modeling techniques, with windowed Gaussian process regression models providing the most accurate results for the data set investigated. Did you like this research project? To get this research project Guidelines, Training and Code... Click Here facebook twitter google+ linkedin stumble pinterest Fault Detection and Classification in Plasma Etch Equipment for Semiconductor Manufacturing -Diagnostics An Experimental Comparison of Production Planning Using Clearing Functions and Iterative Linear Programming-Simulation Algorithms
