Influence of Sputtering Power on Static and Dynamic Magnetic Properties of FeCoN Films PROJECT TITLE :Influence of Sputtering Power on Static and Dynamic Magnetic Properties of FeCoN FilmsABSTRACT:A series of sputtered FeCoN skinny films were deposited on Si (100) at completely different power levels. Films sputtered with 150 W of power exhibited nearly in-plane isotropy accompanied with comparatively high coercivity of about 50 Oe due to weak perpendicular anisotropy. When the deposition power was 250 W and above, a well-defined in-plane anisotropy emerged with an anisotropy field within the vary of 41 to 109 Oe; the coervivity was significantly reduced to a few oersteds. Dynamic magnetic properties were measured with the shorted microstrip transmission-line perturbation method. Controllable and high microwave permeability was obtained for films deposited under high sputtering power. The variations in soft magnetic properties and magnetization dynamics originate from the changes in film composition and residual stress. Did you like this research project? To get this research project Guidelines, Training and Code... Click Here facebook twitter google+ linkedin stumble pinterest Assessment of Multi-Joint Coordination and Adaptation in Standing Balance: A Novel Device and System Identification Technique Filling Effect on Constitutive Parameters of Metamaterials With Inductive Inclusions
