PROJECT TITLE :

Comparison of defects in crystalline oxide semiconductor materials by electron spin resonance

ABSTRACT:

Defects in crystalline InGaZnO4 (IGZO) induced by plasma were investigated using electron spin resonance (ESR). Thermal stabilities and ɡ factors of two ESR signals (A and B observed at ɡ = 1.939 and 2.003, respectively) in IGZO were different from those of the ESR signals observed in component materials such as Ga2O3 (signal observed at ɡ = 1.969), In2O3 (no signal), and ZnO (signal observed at ɡ = 1.957). Signal A in IGZO increased upon annealing at 300 °C for 1 h, but decreased when annealing was continued for more than 2 h. On the other hand, signal B decreased upon annealing at 300 °C for 1 h. The ESR signal in ZnO decayed in accordance with a second-order decay model with a rate constant of 2.1 × 10−4 s−1; however, this phenomenon was not observed in other materials. This difference might have been due to randomly formed IGZO lattices such as asymmetrical (Ga, Zn)O and In-O layers. Defects in signals A and B in IGZO were formed in trap states (at the deep level) and tail states, respectively.