Light Interference Map: A Prescriptive Optimization of Lithography-Friendly Layout PROJECT TITLE :Light Interference Map: A Prescriptive Optimization of Lithography-Friendly LayoutABSTRACT:Achieving lithography-friendly layout typically involves repeated heuristic optimization and lithography simulations, and so is terribly time-consuming. We tend to propose a light interference map (LIM), in which the value of a explicit location represents the extent of potential lightweight interference to nearby patterns if some patterns are relocated (or some new patterns are introduced) to that location. LIM of a single pattern (e.g., contact or via) is obtained through repeated lithography simulations but only once. Superposition of single-pattern LIMs then yields the LIM of an arbitrary layout. LIM opens a possibility of prescriptive layout optimization, that is demonstrated through 2 example applications: optimizing some contact and via positions and SRAF placement. They're evaluated in 28 nm technology in terms of reduced defect chance. Did you like this research project? To get this research project Guidelines, Training and Code... Click Here facebook twitter google+ linkedin stumble pinterest Negatively Correlated Search On log-cumulants of multilook polarimetric whitening filter for polarimetric SAR data
