A Defect-Centric Analysis of the Temperature Dependence of the Channel Hot Carrier Degradation in nMOSFETs PROJECT TITLE :A Defect-Centric Analysis of the Temperature Dependence of the Channel Hot Carrier Degradation in nMOSFETsABSTRACT:The defect-centric distribution is used to review the temperature dependence of channel hot carrier (CHC) degradation in deeply scaled nMOSFETs. We have a tendency to analyze the temperature dependence in terms of the defect-centric parameters. The full number of traps is observed to increase with temperature, whereas the common threshold voltage shift created by a single charged defect, i.e., , is confirmed to be freelance of the temperature, as previously shown for bias temperature instability. By using the defect-centric analysis, we have a tendency to estimate the activation energy of the threshold voltage shift and that of the number of charged traps per device, that are directly linked to the CHC degradation. Did you like this research project? To get this research project Guidelines, Training and Code... Click Here facebook twitter google+ linkedin stumble pinterest Affective Computing and Sentiment Analysis History-aware page replacement algorithm for NAND flash-based consumer electronics