Optimization of the Optical Whiteness Ratio for Flexible Display by Using Taguchi's Dynamic Approach

Spatiotemporal Pattern Modeling for Fault Detection and Classification in Semiconductor Manufacturing

Enabling Scatterometry as an In-Line Measurement Technique for 32 nm BEOL Application

Estimating the Process Yield of Multiple Characteristics With One-Sided Specifications

Adhesion of Contaminant Particles to Advanced Photomask Materials

Statistical Comparison of Fault Detection Models for Semiconductor Manufacturing Processes

Max Separation Clustering for Feature Extraction From Optical Emission Spectroscopy Data

Intelligent Patient Management and Resource Planning for Complex, Heterogeneous, and Stochastic Healthcare Systems

Effects of Polishing Parameters on Evolution of Different Wafer Patterns During Cu CMP

Transport Phenomena in a Novel Large MOCVD Reactor for Epitaxial Growth of GaN Thin Films