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  3. Semiconductor Manufacturing
  4. Special issue on advanced modeling of power devicesand their applications
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Category: Semiconductor Manufacturing Projects
By MTech Projects
MTech Projects
06.Apr
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Special issue on advanced modeling of power devicesand their applications

PROJECT TITLE :

Special issue on advanced modeling of power devicesand their applications

ABSTRACT:

Prospective authors are requested to submit new, unpublished manuscripts for inclusion in the upcoming event described in this call for papers.

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  • Global and Local Virtual Metrology Models for a Plasma Etch Process
  • Fault Detection Using Random Projections and k-Nearest Neighbor Rule for Semiconductor Manufacturing Processes
  • Preaggregation Functions: Construction and an Application
  • Analyzing UV/Vis/NIR Spectra-Sputtered ZnO:Al Thin-Films III: Plasma-Parameter Dep.
  • Metrology Sampling Strategies for Process Monitoring Applications
  • Spectral Evidence of Si Complexes in HVPE-Grown GaAs
  • Uniform, Low-Resistive Ni-Pt Silicide Fabricated by Partial Conversion With Low Metal-Consumption Ratio
  • Effects of Polishing Parameters on Evolution of Different Wafer Patterns During Cu CMP
  • A Comparative Study of Metamodels for Fast and Accurate Simulation of Nano-CMOS Circuits
  • Statistical Comparison of Fault Detection Models for Semiconductor Manufacturing Processes
Previous article: Discovering Correlated Parameters in Semiconductor Manufacturing Processes: A Data Mining Approach Discovering Correlated Parameters in Semiconductor Manufacturing Processes: A Data Mining Approach Next article: Enabling Scatterometry as an In-Line Measurement Technique for 32 nm BEOL Application Enabling Scatterometry as an In-Line Measurement Technique for 32 nm BEOL Application
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