PROJECT TITLE :

Simple process for single-layer nanowire gratings

ABSTRACT:

A straightforward fabrication method for single-layer nanowire gratings (SLNGs) is proposed. On the idea of this process, an SLNG polariser with a one.3 × 1.three mm space of grating patterns and a one hundred nm linewidth was successfully fabricated. 1st, the nanograting patterns were transferred from a metal master stamp to a soft IPS mould using the recent embossing process and therefore the nanograting patterns on the IPS mould were transferred to the imprint resist layer by UV nanoimprint process subsequently; then, after a residual resist removal method, an aluminium layer was thermally evaporated on the substrate to form a bilayer nanowire grating structure; and at last, SLNGs were fabricated by an oxygen plasma ashing process. The inspection results show sensible consistency in the entire grating patterns area. The experimental result demonstrates that the proposed easy method will be adaptable to fabrications of high-density and giant-space nanometal patterns.