Automatic-Patterned Sapphire Substrate Nanometrology Using Atomic Force Microscope


Light emitting diodes become brighter as a result of of the contribution of patterned sapphire substrates (PSS). The scale of PSS crucially affect its performance. The foremost appropriate instrument to live PSS is atomic force microscope, that provides 3-dimensional surface profiles. This paper proposes an automatic methodology to analyze AFM-collected raw data and manufacture characteristic parameters of PSS, as well as height, diameters, pitch, and aspect angles. Experimental results show that this technique has sensible repeatability of one.a pair of and six.three nm on measuring height and bottom diameter, respectively. This nanometrology method can be extensively applicable for similar nanostructures with periodic patterns.

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