PROJECT TITLE :
A Single Wavelength 25-Gb/s Symmetric FDMA PON
We tend to demonstrate electro-optic long period grating in Ti:LiNbO3 strip waveguide embedded in a very planar waveguide. The device was fabricated beginning from a Z-cut congruent plate with a technological method in sequence of planar waveguide, strip waveguide, SiO2 buffer layer, and periodical electrode. The rejection band of the device with a grating pitch 675 μm is observed at the one.1-one.three-μm wavelength regime with a most contrast of twenty seven dB below the 360 V driving voltage. It is found that the band red-shifts linearly with the voltage increase. The shift is ~one hundred sixty nm as the voltage is increased from 100 to five hundred V and lasts 1 min. Accompanying the shift, the distinction reduces. The shift is attributed to different photorefraction effects in planar and strip waveguides. Higher than 360 V, the distinction decreases thanks to photorefraction impact and over-coupling phenomenon.
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