Deposition of Carbon Nanotubes on CMOS


We demonstrate the growth of multi wall and single wall carbon nanotubes (CNT) onto substrates containing commercial 1-μm CMOS integrated circuits. The low substrate temperature growth (450 °C) was achieved by using hot filament (1000 °C) to preheat the source gases (C2H 2 and NH3) and in situ mass spe-ctroscopy was used to identify the gas species present. Field effect transistors based on Single Walled Carbon Nanotube (SWNT) grown under such conditions were fabricated and examined. CNT growth was performed directly on the passivation layer of the CMOS integrated circuits. Individual n- and p-type CMOS transistors were compared before and after CNT growth. The transistors survive and operate after the CNT growth process, although small degradations are observed in the output current (for p-transistors) and leakage current (for both p- and n-type transistors).

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