PROJECT TITLE :
Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
Self-imaging is a well-known optical phenomenon made by diffraction of a coherent beam during a periodic structure. The self-imaging impact (or Talbot result) replicates the field intensity at a periodic mask in certain planes, effectively manufacturing in those planes a picture of the mask. However, the result has not been analyzed for a rough-line grid from the point of view of the fidelity of the image. In this paper, we tend to investigate the restorative effect of the self-image applied to the lithography of gratings with rough lines. This paper is applied to characterize a Talbot lithography experiment implemented in the intense ultraviolet. With the self-imaging technique, a mask with grid patterns having bumps randomly placed along the road edges reproduces a grid pattern with smoothed line edges. Simulation explores the approach additional for the cases of sub-one hundred-nm pitch grids.
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