Investigation Into the Quality Factor of Piezoelectric-on-Silica Micromachined Resonators


In this paper, we have a tendency to investigate loss mechanisms in piezoelectric-on-silica bulk acoustic wave resonators, as well as those resulting from thermoelastic damping (TED), surface roughness, and supporting tethers. Alternate resonator designs, piezoelectric materials, and fabrication processes are demonstrated to empirically check these loss mechanisms. Quality factors (Qs) within the order of $sim sixteen$ 000 at a center frequency of 5 MHz have been consistently measured for aluminum nitride (AlN)-on-silica coupled-ring resonators. It is shown that neither TED nor surface losses are the dominant sources of loss for AlN-on-silica resonators within the megahertz regime. Instead, it is steered that charge redistribution loss resulting from non-uniform strain across the piezoelectric layer is the dominant loss mechanism, with a charge redistribution $Q$ of $sim thirty eight$ 00zero at 5 MHz for AlN-on-silica devices. When all loss mechanisms are thought-about, the full $Q$ is estimated to be 25000, a worth cherish the measured results of the piezoelectric-on-silica resonators of this paper. [2015-0004]

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