Characterization of Oxide-Coated Polysilicon Disk Resonator Gyroscope Within a Wafer-Scale Encapsulation Process


During this paper, we have a tendency to gift the fabrication and check results of an oxide-coated polysilicon disk resonator gyroscope during a wafer-scale encapsulation process. We have a tendency to demonstrate the consequences of an oxide coating on the device structure and therefore the key performance parameters of resonant-primarily based sensors, like the temperature coefficient of frequency and quality factor ( $Q$ ). Results from the as-fabricated device show that a thin oxide coating reduces the surface roughness of a totally encapsulated device by $10times $ , compared with a polysilicon device without the oxide coating. This will increase the uniformity across the wafer, providing higher method yield. The open-loop rate measurement mode reveals an angle random walk of 0.eighteen°/ $surd $ hr and a bias instability of one.forty three°/hr. [2015-0124]

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