Sell Your Projects | My Account | Careers | This email address is being protected from spambots. You need JavaScript enabled to view it. | Call: +91 9573777164

Characterization of Oxide-Coated Polysilicon Disk Resonator Gyroscope Within a Wafer-Scale Encapsulation Process

1 1 1 1 1 Rating 4.80 (49 Votes)

PROJECT TITLE :

Characterization of Oxide-Coated Polysilicon Disk Resonator Gyroscope Within a Wafer-Scale Encapsulation Process

ABSTRACT:

During this paper, we have a tendency to gift the fabrication and check results of an oxide-coated polysilicon disk resonator gyroscope during a wafer-scale encapsulation process. We have a tendency to demonstrate the consequences of an oxide coating on the device structure and therefore the key performance parameters of resonant-primarily based sensors, like the temperature coefficient of frequency and quality factor ( $Q$ ). Results from the as-fabricated device show that a thin oxide coating reduces the surface roughness of a totally encapsulated device by $10times $ , compared with a polysilicon device without the oxide coating. This will increase the uniformity across the wafer, providing higher method yield. The open-loop rate measurement mode reveals an angle random walk of 0.eighteen°/ $surd $ hr and a bias instability of one.forty three°/hr. [2015-0124]


Did you like this research project?

To get this research project Guidelines, Training and Code... Click Here


Characterization of Oxide-Coated Polysilicon Disk Resonator Gyroscope Within a Wafer-Scale Encapsulation Process - 4.8 out of 5 based on 49 votes

Project EnquiryLatest Ready Available Academic Live Projects in affordable prices

Included complete project review wise documentation with project explanation videos and Much More...