PROJECT TITLE :
Solar-Blind Photoresistors Based on $hbox_ hbox_hbox$ Thin Films Grown on $rhbox_ hbox_$ Substrates by Radio-Frequency Plasma-Assisted Molecular Beam Epitaxy
Solar-blind photoresistors primarily based on $hboxMg_0.48hboxZn_0.52 hboxO$ thin films were fabricated on $r$-plane sapphire substrates by radio-frequency plasma-assisted molecular beam epitaxy. High-quality $a$-plane-orientation single-section wurtzite $hboxMg_0.48hboxZn_0.52hboxO$ skinny films are demonstrated by X-ray diffraction and absorption spectra. The MgZnO photoresistors exhibit a massive dark/photoresistance ratio up to $hbox1.7 times hbox10^4$ with the light intensity of 0.61 $hboxmW/cm^2$ at 260 nm. The spectral response shows a pointy response peak only within the solar-blind region with maximum responsivity of $hbox1.5 times hbox10^-3 Omega^-1cdothboxW^-1$ .
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