Comparative Study of Active-Over-Metal and Metal-Over-Active Amorphous IGZO Thin-Film Transistors With Low-Frequency Noise Measurements


Bottom-gate metal-over-active (MOA) and active-over-metal (AOM) amorphous indium–gallium–zinc–oxide (a-IGZO) thin-film transistors (TFTs), with channel lengths varying from 1 to 16 $muhbox{m}$, are investigated with low-frequency noise (LFN) measurements in the linear region of operation. In the low drain–current range, LFN originates from carrier number fluctuations, whereas in the high drain–current range, the noise is affected by the series resistance. The extracted gate-insulator trap densities near the interface lead to the conclusion that the AOM a-IGZO TFTs are superior compared to the MOA devices.

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