PROJECT TITLE :

6.5 V High Threshold Voltage AlGaN/GaN Power Metal-Insulator-Semiconductor High Electron Mobility Transistor Using Multilayer Fluorinated Gate Stack

ABSTRACT:

In this letter, the approach of partial AlGaN recess and multiple layers of fluorinated Al2O3 gate dielectric is utilized to achieve highest reported positive gate threshold voltage ( $V_textrm TH$ ) without severe reduction on two-D electron gas carrier mobility in AlGaN/GaN HEMTs. Guided by the look and verification through analytical model, correct fluorine ions incorporation is made through fabrication. The approach resulted during a high $V_textrm TH$ of +half dozen.5 V and competitive drain saturation current ( $I_textrm DMAX$ ) of 340 mA/mm. Furthermore, low gate leakage current and high breakdown voltage of 1140 V were also demonstrated.


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