High-resolution nanopatterning by achromatic spatial frequency multiplication with electroplated grating structures PROJECT TITLE :High-resolution nanopatterning by achromatic spatial frequency multiplication with electroplated grating structuresABSTRACT:The authors demonstrate generation of high-resolution nanostructures using achromatic spatial frequency multiplication in the extreme ultraviolet wavelength region. The technique based on the achromatic Talbot effect is used for periodic transmission gratings under wideband illumination, enabling one- and two-dimensional nanopatterns with sub-20 nm feature sizes. The transmission masks with desired properties are fabricated with electron-beam lithography followed by electroplating of gold. Features sizes down to 12 nm are obtained. The presented technique provides high-throughput and large-area nanopatterning with great flexibility in tuning pattern parameters such as linewidth and dot size. Did you like this research project? To get this research project Guidelines, Training and Code... Click Here facebook twitter google+ linkedin stumble pinterest Impact of mask absorber thickness on the focus shift effect in extreme ultraviolet lithography Analytical and experimental evaluation of a counting method for particles added during the mask handling process